Deng long Shuai and instruments Ming et al., Application of ICP-MS, AFM and XPS analysis of the dissolved solution while stirring the same and different pH values in an argon and oxygen environment different mechanical brass ore characteristics and surface properties, to establish a chalcopyrite Dissolution model in aqueous solution. The experimental results show that the concentration of steel and iron in solution can be fitted to the equation c=ksat+b in pure water; the low pH value is beneficial to the dissolution of chalcopyrite; the surface oxidation is slow, on brass The solubility of ore is weak; the solubility of chalcopyrite in pure water has little effect on the effective specific surface area. The dissolution of chalcopyrite under acidic conditions is controlled by surface chemical reaction; the surface of chalcopyrite is rich in copper after long-term dissolution; Dissolution increases surface roughness and lattice defects.

Luo Zhenghong et al. studied the dissolution behavior of chalcopyrite in acidic medium, investigated the effects of temperature, acid concentration and leaching time on the acid leaching behavior of chalcopyrite, and analyzed the change behavior of elemental sulfur and the microstructure of residue. The results show that the hydrogen leaching stage of the chalcopyrite wet leaching process will produce hydrogen sulfide; the dissolution capacity of chalcopyrite will change quickly and slowly with temperature, and the latter will increase linearly. The dissolution mainly occurs in the first 2 h; Conducive to dissolution, and the optimum acid leaching pH is about 0.4. The effect of pH on dissolution is less than the effect of temperature.

The oxidizing and strong oxidizing electrolyte solution maximizes the dissolution rate of chalcopyrite. Gülfen studied the effect of Fe2O3 on the dissolution of chalcopyrite in sulfuric acid solution. Goyne, Ikiz and Padilla et al studied the hydrogen peroxide, potassium chromium weight, hypochlorous acid, an organic acid and dissolved oxygen dissolved in the solution kinetics of chalcopyrite. The oxidative dissolution mechanism and the like have been extensively studied.

In the analytical method, Al-Harahsheh applied time-of-flight secondary ion mass spectrometry (TOF-SIMS) and scanning electron microscopy (SEM) to analyze the selective oxidation properties of chalcopyrite. Sasaki performed XPS analysis on the oxidative dissolution of chalcopyrite in pH 2, 5, and 11 solutions.

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